Dong Chen


publish date:  05/27/2018 02:41 PM

Name: Dong Chen




Gender: Female       Position: Associate Professor

      


E-mail: dongchen@henu.edu.cn        Department: College of Physics and Electronics

Short Biography:

2014 to 2015: Visiting Assistant Research Scientist, Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, USA.

2010 to present: Associate Professor, College of Physics and Electronics, Henan University, Kaifeng, China.

2006-2010: Ph.D. in Material Science and Engineering, Hunan University, Changsha, China.

2008-2010: Joint Ph.D. in Fundamental & Computational Sciences Directorate, Pacific Northwest National Laboratory, Richland, USA.

2003-2006: M. S. in Condensed Matter Physics, Henan Normal University, Xinxiang, China.

Research interests:

My present work focuses mainly on theoretical simulation to study materials physics and materials science:

Nanostructured Materials, such as Metal and Alloy Nanoparticles;

Electronical properties of 2D materials;

Surface and Nanoparticles of Adsorption and Catalysis;

Dynamic Behaviors of Defects;

Structural Preferences of Biomolecules.

Major publications:

1. D. Chen, F. Gao, Bo Liu, Grain boundary resistance to amorphization of nanocrystalline silicon carbide, Scientific Reports20155.

2. D. Chen, F. Gao, M. Dong, B. Liu, Migration of point defects and a defect pair in zinc oxide using the dimer method, Journal of Materials Research, 2012, 27(17): 2241-2248.

3. D. Chen, Wangyu Hu, Fei Gao, Huiqiu Deng and Lixian Sun, Tungsten cluster migration on nanoparticles: minimum energy pathway and migration mechanismThe European Physical: Journal B, 2011, 80(1): 31-40. (COVER PAPER)

4. D. Chen, F. Gao, W. Hu, S. Y. HuD. Terentyev, X. Sun, H. L. Heinisch, C. H. Henager, and M. A. Khaleel, Migration of Cr-Vacancy clusters and interstitial Cr in α-Fe using the dimer methodPhysical Review B201081(6): 064101-064109.

5. F. Gao, D. Chen, W. Hu, W. J. Weber, Energy dissipation and defect generation in nanocrystalline silicon carbide, Physical Review B, 2010, 81(18): 184101-184108.